Wafer process and fab models#
Build a layered wafer recipe or a fab schedule and inspect profiles, conservation and equipment utilization.
Open the workbench#
Choose Wafer Process & Fab from the workspace menu. Select the layered wafer model or the fab scheduling model. Forms edit the model input; Run performs the calculation, and Cancel stops the worker. Editing an input makes previous results stale.
Build a wafer recipe#
Define materials and their model coefficients.
List planar layers from the surface inward, with thickness and initial concentration.
Add deposition, selective etch or diffusion steps in execution order.
Check units: length nm, time s, temperature K, concentration cm^-3 and dose cm^-2.
Run and compare the initial profile with each stage. Inspect thickness, dose changes, boundary dose and conservation error.
Refine mesh and time steps and compare the result before relying on a profile. The model uses supplied material coefficients and planar layers. It does not infer calibrated foundry data, lateral geometry, plasma chemistry, stress or TCAD signoff.
Build a fab schedule#
Define equipment capacity and planned downtime.
Set routes, processing/setup/transport times, and any repeated visits to equipment.
Add lots with release time, priority and wafer count; choose the available dispatch rule.
Run and inspect equipment timelines, completed lots, queue/cycle times and utilization.
Check lots unfinished at the chosen horizon before comparing throughput between scenarios.
Durations are model inputs. A recipe reference records linkage but does not turn supplied processing times into measured factory cycle times. Random failures, batch formation and yield are not inferred by this deterministic schedule.
Save and compare scenarios#
Export the input JSON and completed result together. Name each scenario and change one assumption at a time, such as deposition duration, diffusivity or equipment capacity. Retain units, mesh/time settings and the exact executed input with every result. These files are separate from native CAD project persistence.